LEEPL awarded with the Prize for Promoting Machine Industry for Low Energy E-beam Proximity Lithography Device for Semiconductor Manufacturing
Tokyo Seimitsu Co., Ltd. (Chairman & CEO: Hideo Ohtsubo) is proud to announce that the LEEPL Corp. (President: Nobuo Shimazu), one of its subsidiaries, has won the Chairman's Award in the 2nd Prize Competition for Promoting the Machine Industry sponsored by the Japan Society for the Promotion of Machine Industry (Supported by: Ministry of Economy Trade and Industry, the Small and Medium Enterprise Agency, Japan Keirin Association, the Organization for Small and Medium Enterprise and Regional Innovation, Japan, the Japan Machinery Federation, and the Nihon Keizai Shimbun, Inc.).
This award is given in recognition of a significant contribution in the research and development of technology for the machinery industry, or the practical application thereof.
The LEEPL Corp.'s “Low Energy E-beam Proximity Lithography Device for Semiconductor Manufacturing” was developed for use in the all-important lithography process in response to the serious problem of cost increases brought about by increasingly microscopic patterns. It enables low energy electro-beam to be used in place of light in order to transfer the patterns, providing higher efficiency and outstanding duplication precision of microscopic patterns.
In parallel with this development, the company has initiated to promote and organize development of related technologies with a consortium comprised of 31 companies in Japan and abroad, and has shown that it is pioneering tomorrow's technology for the semiconductor industry with its unique technology originated in Japan. The Chairman's Award is being given in recognition of this work.
LEEPL was recommended for this award by the Semiconductor Equipment Association of Japan, and the award ceremony is scheduled to take place on January 24, 2005.
