Tokyo Seimitsu ACCRETECH (Chairman and CEO: Hideo Ohtsubo) will boost the function and lineup of, its CMP devices for mass production. The new product series will be marketed as "the ChaMP series" and will replace the current "A-FP series" as the company standard.

The "ChaMP" series builds on the outstanding characteristics of A-FP, namely, low-pressure, stable polishing using an air-float polishing head "Sylphide", as well as high-precision end-point detection using white light. "ChaMP" comes equipped with a variety of features designed to enhance process performance, productivity, and mass production adaptability. We are confident that it is the easiest to use and the most productive of all CMP devices currently sold on the market.

Besides the conventional models featuring the 3-table, 2-head formation, we have added new types - 2-table, 3-head and 3-table, 3-head - to create a product series that will allow us to meet the diverse needs of our customers.

The "ChaMP" series has already received numerous inquiries and orders from various semiconductor manufacturers planning to invest in new 300 mm-line facilities, and from other companies. At Tokyo Seimitsu, we aim to position this product as a market leader, dramatically expanding our market share and rewriting the industry map.

Overview of the "ChaMP" series

1. Major characteristics and performance

• (1) dramatically increased table rotation (oscillation) rate.
• (2) increased number of zones for controlling the polishing profile, enabling even more precise control.
• (3) complete flexibility in table/head combinations. (Besides the conventional 3-table, 2-head type, we have added 2-table, 3-head and 3-table, 3-head types)

2. Sales plan

• FY2004: 15 to 20 units
• FY2005: 30 to 50 units